Low-temperature characterization and micropatterning of coevaporated Bi2 Te3 and Sb2 Te3 films

Journal of Applied Physics

Volumn 104, Issue 11, 2008, Pages

  Huang, Baoling ^a   Lawrence, Chris ^a   Gross, Andrew ^a   Hwang, Gi Suk ^a   Ghafouri, Niloufar ^a   Lee, Sang Woo ^a   Kim, Hanseup ^a   Li, Chang Peng ^a   Uher, Ctirad ^a   Najafi, Khalil ^a   Kaviany, Massoud ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POWER FACTOR; ELECTRIC RESISTANCE; GALVANOMAGNETIC EFFECTS; HALL EFFECT; HALL MOBILITY; MAGNETIC FIELD EFFECTS; TELLURIUM COMPOUNDS;

BULK MATERIALS; CO EVAPORATED; COEVAPORATION DEPOSITIONS; DEPOSITION CONDITIONS; ELECTRICAL RESISTIVITIES; FILM COMPOSITIONS; FLUX RATIOS; HALL COEFFICIENTS; LOW TEMPERATURES; MICROPATTERNING; POWER FACTORS; SCATTERING MECHANISMS; SHADOW MASK TECHNIQUES; SUBSTRATE MATERIALS; SUBSTRATE TEMPERATURES; TEMPERATURE CHARACTERIZATIONS; TEMPERATURE DEPENDENCES; TEMPERATURE DEPENDENTS;

FILMS;

EID: 58149267557     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3033381     Document Type: Article

References (22)

1. A. Gross, B. L. Huang, G. S. Hwang, C. Lawrence, N. Ghafouri, S. W. Lee, H. Kim, C. Uher, M. Kaviany, and K. Najafi, IEEE 21st International Conference on Microelectromechanical Systems, 2008 (unpublished), p. 840-843.
2. L. W. da Silva and M. Kaviany, Int. J. Heat Mass Transfer 0017-9310 10.1016/j.ijheatmasstransfer.2003.11.024 47, 2417 (2004).
3. G. Min and D. M. Rowe, Solid-State Electron. 0038-1101 10.1016/S0038-1101(99)00045-3 43, 923 (1999).
4. H. Böttner, J. Nurnus, A. Gavrikov, G. Kühner, M. Jägle, C. Kunzel, D. Eberhard, G. Plescher, A. Schubert, and K. H. Schlereth, J. Microelectromech. Syst. 1057-7157 10.1109/JMEMS.2004.828740 13, 414 (2004).
5. L. W. da Silva and M. Kaviany, J. Microelectromech. Syst. 14, 1110 (2005). 1057-7157
6. L. M. Goncalves, J. Nurnus, C. Couto, P. Alpuim, G. Min, D. M. Rowe, and J. H. Correia, J. Microelectromech. Syst. 17, S168 (2007). 1057-7157
7. L. W. da Silva, M. Kaviany, and C. Uher, J. Appl. Phys. 0021-8979 10.1063/1.1914948 97, 114903 (2005).
8. H. Zou, D. M. Rowe, and S. G. K. Williams, Thin Solid Films 0040-6090 10.1016/S0040-6090(02)00077-9 408, 270 (2002).
9. D. -H. Kim, E. Byon, G. -H. Lee, and S. Cho, Thin Solid Films 0040-6090 510, 148 (2006).
10. R. Venkatasubramanian, T. Colpitts, E. Watko, M. Lamvik, and N. ElMasry, J. Cryst. Growth 0022-0248 10.1016/S0022-0248(96)00656-2 170, 817 (1997).
11. A. Giani, A. Boulouz, F. Pascal-Delannoy, A. Foucaran, E. Charles, and A. Boyer, Mater. Sci. Eng., B 0921-5107 10.1016/S0921-5107(99)00142-7 64, 19 (1999).
12. J. Nurnus, H. Beyer, H. Bottner, and A. Lambrecht, 5th European Workshop on Thermoelectrics, 1999 (unpublished), Vol. 1, p. 1.
13. J. R. Lim, G. J. Synder, C. -K. Huang, J. A. Herman, M. A. Ryan, and J. P. Fleurial, Proceedings of the 21st International Conference on Thermoelectrics, 2002 (unpublished), pp. 535-539.
14. H. J. Goldsmid, Thermoelectric Refrigeration (Plenum, New York, 1964).
15. J. P. Fleurial, L. Gailliard, R. Triboulet, H. Scherrer, and S. Scherrer, J. Phys. Chem. Solids 0022-3697 10.1016/0022-3697(88)90182-5 49, 1237 (1988).
16. A. Mzerd, D. Sayah, G. Brun, J. C. Tedenac, and A. Boyer, J. Mater. Sci. Lett. 0261-8028 10.1007/BF00318254 14, 194 (1995).
17. E. M. Conwell, Phys. Rev. 0031-899X 10.1103/PhysRev.103.51 103, 51 (1956).
18. T. C. Harman, B. Paris, S. E. Miller, and H. L. Goering, J. Phys. Chem. Solids 0022-3697 10.1016/0022-3697(57)90081-1 2, 181 (1957).
19. C. Drasar, M. Steinhart, P. Lostak, H. -K. Shin, J. S. Dyck, and C. Uher, J. Solid State Chem. 178, 1301 (2005). 0022-4596
20. J. Singh, Electronic and Optoelectronic Properties of Semiconductor Structures (Cambridge, New York, 2003).
21. T. J. Scheidemantel, C. Ambrosch-Draxl, T. Thonhauser, J. V. Badding, and J. O. Sofo, Phys. Rev. B 0163-1829 10.1103/PhysRevB.68.125210 68, 125210 (2003).
22. G. D. Mahan, Solid State Phys. 51, 82 (1997). 0002-7820