Oxygen vacancy kinetics in ferroelectric Pb Zr0.4 Ti0.6 O3

Journal of Applied Physics

Volumn 104, Issue 11, 2008, Pages

  Gottschalk, S ^a,b   Hahn, H ^a,b   Flege, S ^b   Balogh, A G ^b  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; DEPTH PROFILING; DIFFUSION; DOPING (ADDITIVES); EPITAXIAL FILMS; FERROELECTRICITY; GRAIN BOUNDARIES; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; ION EXCHANGE; ISOTOPES; LEAD; LEAD ALLOYS; MASS SPECTROMETERS; MASS SPECTROMETRY; OXYGEN; OZONE WATER TREATMENT; SECONDARY ION MASS SPECTROMETRY; SPECTROMETERS; SPECTROMETRY; SPECTRUM ANALYSIS; VACANCIES;

ACTIVATION ENTHALPIES; BULK DIFFUSIONS; CONCENTRATION DEPTH PROFILES; DIFFUSION COEFFICIENTS; DIFFUSION DEPTHS; DIFFUSION PATHS; DIFFUSION PROCESSES; DONOR DOPED; EPITAXIAL THIN FILMS; OXYGEN PARTIAL PRESSURES; OXYGEN18; POLYCRYSTALLINE SAMPLES; SECONDARY IONS; TEMPERATURE RANGES;

OXYGEN VACANCIES;

EID: 58149267478     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2988902     Document Type: Article

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