Patterned backgating using single-sided mask aligners: Application to density-matched electron-hole bilayers

Journal of Applied Physics

Volumn 104, Issue 11, 2008, Pages

  Croxall, A F ^a   Das Gupta, K ^a   Nicoll, C A ^a   Thangaraj, M ^a   Farrer, I ^a   Ritchie, D A ^a   Pepper, M ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CAMERAS; FUNCTIONS; LIGHT EMITTING DIODES; PHOTOGRAPHY; ULTRASONIC APPLICATIONS;

BI LAYERS; BILAYER DEVICES; DOPED LAYERS; ELECTROCHEMICAL POTENTIALS; INFRARED LIGHT EMITTING DIODES; MASK ALIGNERS; ROBUST METHODS; SEMI-CONDUCTORS;

MATHEMATICAL MODELS;

EID: 58149215596     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3032942     Document Type: Article

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