Growth of flat SrRuO3 (111) thin films suitable as bottom electrodes in heterostructures

Thin Solid Films

Volumn 517, Issue 6, 2009, Pages 1904-1907

  Rubi, D ^a   Vlooswijk, A H G ^a   Noheda, B ^a  

^a UNIVERSITY OF GRONINGEN   (Netherlands)

Author keywords

Atomic force microscopy; Ferromagnetic metallic electrodes; Strontium ruthanate; Surface roughness

Indexed keywords

ALKALINE EARTH METALS; ATOMIC FORCE MICROSCOPY; ATOMIC PHYSICS; CRYSTALS; ELECTRODES; EPITAXIAL FILMS; FERROELECTRIC FILMS; FERROELECTRIC MATERIALS; FERROMAGNETIC MATERIALS; FERROMAGNETISM; FILMS; FRICTION; GROWTH (MATERIALS); PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; STRONTIUM; STRONTIUM ALLOYS; SURFACE PROPERTIES; SURFACE ROUGHNESS; THIN FILMS;

BOTTOM ELECTRODES; FERROMAGNETIC METALLIC ELECTRODES; FLAT ELECTRODES; HETEROSTRUCTURES; MULTIFERROIC MATERIALS; POLAR ORIENTATIONS; PULSED LASERS;

FILM GROWTH;

EID: 58149092939     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.09.106     Document Type: Article

References (15)

1. Eom C.B., Cava R.J., Fleming R.M., Philips J.M., van Dover R.B., Marshall J.H., Hsu W.P., Krajewski J.J., and Peck Jr. W.F. Science 258 (1992) 1766
2. Gan Q., Rao R.A., and Eom C.B. Appl. Phys. Lett. 70 (1997) 1962
3. Choi J., Eom C.B., Rijnders G., Rogalla H., and Blank D.H.A. Appl. Phys. Lett. 79 (2001) 1447
4. Sánchez F., Garcia-Cuenca M.V., Ferrater C., Varela M., Herranz G., Martinez B., and Fontcuberta J. Appl. Phys. Lett. 83 (2003) 902
5. Sánchez F., Herranz G., Infante I.C., Fontcuberta J., Garcia-Cuenca M.V., Ferrater C., and Varela M. Appl. Phys. Lett. 85 (2004) 1981
6. Sánchez F., Herranz G., Infante I.C., Ferrater C., Garcia-Cuenca M.V., Varela M., and Fontcuberta J. Prog. Solid State Chem. 34 (2006) 213
7. Vasco E., Dittmann R., Karthauser S., and Waswe R. Appl. Phys. Lett. 82 (2003) 2497
8. Kubel F., and Schmid H. Acta Crystallogr., B 46 (1990) 698
9. Lee H.N., Christen H.M., Chrisholm M.F., Rouleau C.M., and Lowndes D.H. Nature 433 (2005) 395
10. Funakubo H., Oikawa T., Higashi N., and Saito K. J. Cryst. Growth 235 (2002) 401
11. Sumi A., Kim Y.K., Oshima N., Akiyama K., Saito K., and Funakubo H. Thin Solid Films 486 (2005) 182
12. Ito A., Masumoto H., and Goto T. Mater. Trans. 48 (2007) 227
13. Koster G., Kropman B.L., Rijnders G.J.H.M., Blank D.H.A., and Rogalla H. Appl. Phys. Lett. 73 (1998) 2920
14. Asthagiri A., Niederberger C., Francis A.J., Porter L.M., Salvador P.A., and Scholl D.S. Surf. Sci. 537 (2003) 134
15. In: Chrisey D.B., and Hubler G.H. (Eds). Pulsed Laser Deposition of Thin Films (1994), Wiley Interscience 234