Pure boron-doped photodiodes: A solution for radiation detection in EUV lithography

ESSDERC 2008 - Proceedings of the 38th European Solid-State Device Research Conference

Volumn , Issue , 2008, Pages 278-281

  Sarubbi, F ^a   Nanver, L K ^a   Scholtes, T L M ^a   Nihtianov, S N ^b   Scholze, F ^c  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b ASML   (Netherlands)

^c PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; PHOTODIODES; SEMICONDUCTING SILICON COMPOUNDS; ULTRAVIOLET DEVICES;

DIBORANE; EUV LITHOGRAPHIES; OPTICAL PERFORMANCES; PHOTON DETECTIONS; PURE BORONS; RADIATION DETECTIONS; RESPONSIVITY; SPECTRAL RANGES; SURFACE LAYERS; ULTRA VIOLETS;

CHEMICAL VAPOR DEPOSITION;

EID: 58049105584     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDERC.2008.4681752     Document Type: Conference Paper

References (8)

1. B. M. LaFontaine et al., "The use of EUV lithography to produce demonstration devices," in Proc. SPIE, vol. 6921, Emerging Lithographic Technologies XII, March 2008.
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3. F. Sarabbi, L. K. Nanver, and T. L. M. Scholtes, "CVD delta-doped boron surface layers for ultra-shallow junction formation," ECS Transactions, vol. 3, no. 2, pp. 35-44, November 2006.
4. +-n boron-deposited silicon diodes applied to DUV photodiodes," in Proc. Device Research Conference 2008, in press.
5. F. Scholze et al., "High-accuracy EUV metrology of PTB using synchrotron radiation," in Proc. SPIE, vol. 4344, Metrology, Inspection, and Process Control for Microlithography XV, pp. 402-413, August 2001.
6. F. Scholze, H. Rabus, and G. Ulm, "Mean energy required to produce an electron-hole pair in silicon for photons of energies between 50 and 1500 eV," J. Appl. Phys., vol. 84, no. 5, pp. 2926-2939, September 1998.
7. Physics Laboratory, National Institute of Standards and Technology (NIST). Available 〈http://physics.nist.gov/PhysRefData〉.
8. Center for X-ray Optics, Lawrence Berkeley National Laboratory (LBNL). Available 〈http://henke.lbl.gov/optical-constants〉.