Improved focused ion beam fabrication of near-field apertures using a silicon nitride membrane

Optics Letters

Volumn 33, Issue 23, 2008, Pages 2827-2829

  Brian Leen, J ^a   Hansen, Paul ^a   Cheng, Yao Te ^a   Hesselink, Lambertus ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; FINITE DIFFERENCE TIME DOMAIN METHOD; FOCUSED ION BEAMS; NITRIDES; PLASMONICS; SILICON NITRIDE;

FABRICATION METHOD; FINITE DIFFERENCE TIME DOMAIN SIMULATIONS; MILLING TECHNIQUE; PERIODIC ARRAYS; PLASMONIC DEVICES; SILICON NITRIDE MEMBRANE; SIMULATED RESONANCE; SMALL APERTURE;

TIME DOMAIN ANALYSIS;

ION; SILICON DERIVATIVE; SILICON NITRIDE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; LIGHT; MATERIALS TESTING; METHODOLOGY; OPTICAL INSTRUMENTATION; RADIATION SCATTERING; REFRACTOMETRY; SURFACE PLASMON RESONANCE;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; IONS; LENSES; LIGHT; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; REFRACTOMETRY; SCATTERING, RADIATION; SILICON COMPOUNDS; SURFACE PLASMON RESONANCE;

EID: 57649208448     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/ol.33.002827     Document Type: Conference Paper

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