High speed deposition of SiO2 films with plasma jet based on capillary dielectric barrier discharge at atmospheric pressure

Applied Physics Express

Volumn 1, Issue 6, 2008, Pages 0670091-0670093

  Ito, Yosuke ^a   Urabe, Keiichiro ^a   Takano, Nobuhiko ^a   Tachibana, Kunihide ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATMOSPHERICS; CLIMATOLOGY; DIELECTRIC DEVICES; DISCHARGE (FLUID MECHANICS); ELECTRIC DISCHARGES; FLOW CONTROL; JETS; METEOROLOGY; PLASMA ACCELERATORS; PLASMA DEPOSITION; PLASMA DEVICES; PLASMA JETS; PLASMAS; SILICON COMPOUNDS;

DIELECTRIC BARRIER DISCHARGES; DRIVING FREQUENCIES; EXPERIMENTAL STUDIES; HIGH SPEED DEPOSITIONS; TETRAETHOXYSILANE;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 57649110264     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.1.067009     Document Type: Article

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