Influence of substrate orientation on the morphology and orientation of LaNiO3 thin films

Journal of Microscopy

Volumn 232, Issue 3, 2008, Pages 585-588

  Pocuca M ^a   Brankovic Z ^a   Brankovic G ^a   Vasiljevic Radovic D ^b  

^a UNIVERSITY OF BELGRADE   (Serbia)

^b IHTM Institute of Microelectronic Technologies and Single Crystals   (Serbia)

Author keywords

AFM; LaNiO3; Microstructure; Thin film

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; LANTHANUM COMPOUNDS; MICROSTRUCTURE; SILICON; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

AFM; CHEMICAL METHOD; CITRATE PRECURSOR; DEPOSITED LAYER; HIGHLY ORIENTED FILMS; PRECURSOR SOLUTIONS; SI(1 0 0); SI(111) SUBSTRATE; SUBSTRATE ORIENTATION; THIN-FILMS;

NICKEL COMPOUNDS;

CITRIC ACID; LANTHANUM NICKEL OXIDE; OXIDE; SILICON; UNCLASSIFIED DRUG;

ARTICLE; ATOMIC FORCE MICROSCOPY; CONTROLLED STUDY; CRYSTAL STRUCTURE; CRYSTALLIZATION; FILM; GRAIN; HEATING; MORPHOLOGY; ORIENTATION; PRIORITY JOURNAL; X RAY DIFFRACTION;

EID: 57449108088     PISSN: 00222720     EISSN: 13652818     Source Type: Journal    
DOI: 10.1111/j.1365-2818.2008.02121.x     Document Type: Article

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