Fundamental issues in millisecond annealing

Proceedings - Electrochemical Society

Volumn 1, Issue , 2004, Pages 11-18

  Acharya, N ^a   Timans, P J ^a  

^a MATTSON THERMAL PRODUCTS GMBH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HEAT TRANSFER; ION IMPLANTATION; MOS DEVICES; SEMICONDUCTOR DOPING; SILICON; SILICON COMPOUNDS; SILICON ON INSULATOR TECHNOLOGY; XENON;

FLASH-LAMP ARRAYS; RAPID THERMAL PROCESSING (RTP); SURFACE HEATING; ULTRA-SHALLOW JUNCTIONS (USJ);

RAPID THERMAL ANNEALING;

EID: 5744237336     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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