Line width roughness (LWR) performance of novel surface conditioner solutions for immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Lu, Bo Jou ^a   Liu, E T ^a   Zeng, Anson ^a   Tseng, Aroma ^a   Wu, Steven ^a   Lin, Bill ^a   Yu, Chun Chi ^a   Meng, Ling Jen ^b   Jaramillo Jr , Manuel ^b   Liao, Ming Chi ^b  

^a UNITED MICROELECTRONICS CORPORATION   (Taiwan)

^b AIR PRODUCTS AND CHEMICALS INC   (United States)

Author keywords

LWR iso dense bias; Surface conditioner

Indexed keywords

LIGHT WATER REACTORS; PHOTOLITHOGRAPHY; PHOTORESISTS; SOIL CONDITIONERS; SURFACES; WINDOWS;

45NM NODES; DEPTH OF FOCUSES; IMMERSION LITHOGRAPHIES; LINE WIDTHS; LITHOGRAPHY PROCESS WINDOWS; LITHOGRAPHY PROCESSES; LWR ISO-DENSE BIAS; NOVEL SURFACES; PROCESS IMPROVEMENTS; PROCESS WINDOWS; RESIST PATTERNS; SURFACE CONDITIONER; SURFACE CONDITIONERS;

ROUGHNESS MEASUREMENT;

EID: 57349200531     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772494     Document Type: Conference Paper

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