Double exposure using 193nm negative tone photoresist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 2, 2007, Pages

  Kim, Ryoung Han ^a   Wallow, Tom ^a   Kye, Jongwook ^a   Levinson, Harry J ^a   White, Dave ^b  

^a ADVANCED MICRO DEVICES   (United States)

^b Tokyo Ohka Kogyo America Inc   (United States)

Author keywords

193 nm; Double exposure; Double patterning; Negative tone

Indexed keywords

ETCHING; MASKS; PATTERN RECOGNITION;

DOUBLE EXPOSURE; DOUBLE PATTERNING; NEGATIVE TONE;

PHOTORESISTS;

EID: 35148836673     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.713209     Document Type: Conference Paper

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