Electrodeposited nickel nanodots array on the silicon wafer

Bulletin of the Korean Chemical Society

Volumn 29, Issue 11, 2008, Pages 2169-2171

  Jung, Jin Seung ^a   Kim, Eun Mee ^b   Chae, Weon Sik ^b   Malkinski, Leszek M ^c   Lim, Jin Hee ^c   O'Connor, Charles ^c   Jun, Jong Ho ^d  

^a Gangneung Wonju National University   (South Korea)

^b Korea Basic Science Institute (KBSI)   (South Korea)

^c UNIVERSITY OF NEW ORLEANS   (United States)

^d Konkuk University   (South Korea)

Author keywords

AAO membrane; Electrodeposition; Nickel nanodot

Indexed keywords

ALUMINA; ALUMINUM; ALUMINUM COATINGS; ANODIC OXIDATION; ELECTRODEPOSITION; ELECTRODES; FILM GROWTH; MAGNETISM; METALLIC FILMS; NANOSTRUCTURED MATERIALS; NICKEL; SILICON; SILICON WAFERS;

AAO MEMBRANE; ANODIC ALUMINUM OXIDE MEMBRANES; ELECTRO-DEPOSITED NICKEL; ELECTROCHEMICAL GROWTH; FERROMAGNETIC COUPLING; NANODOTS; SILICON TECHNOLOGIES; TWO STEP ANODIZATION;

MAGNETIC MATERIALS;

EID: 57349118679     PISSN: 02532964     EISSN: 12295949     Source Type: Journal    
DOI: 10.5012/bkcs.2008.29.11.2169     Document Type: Article

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