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Volumn 6923, Issue , 2008, Pages
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Process induced bias: A study of resist design and process implications
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Author keywords
[No Author keywords available]
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Indexed keywords
DATA STORAGE EQUIPMENT;
DESIGN;
PHOTORESISTS;
SCANNING;
SENSITIVITY ANALYSIS;
STRUCTURAL DESIGN;
CD BIASES;
CD ERRORS;
CD VARIATIONS;
COMPENSATION STRATEGIES;
CRITICAL DIMENSION UNIFORMITIES;
EXPOSURE DOSES;
IMPACT PROCESSES;
PEB TEMPERATURES;
PROCESS COMPENSATIONS;
PROCESS VARIATIONS;
PROCESSING EFFECTS;
RESIST MATERIALS;
RESIST MODELS;
SIGNIFICANT IMPACTS;
SPECIFIC STRUCTURES;
WAFER ETCHINGS;
WAFER VARIATIONS;
PROCESS ENGINEERING;
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EID: 57349108721
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.773187 Document Type: Conference Paper |
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Times cited : (2)
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References (7)
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