Advanced process control applied to 90-nm lithography and etch

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 II, Issue , 2003, Pages 972-978

  Kota, Gowri P ^a   Luque, Jorge ^a   Dusa, Mircea ^b   Hunter, Adolph ^b  

^a LAM RESEARCH CORPORATION   (United States)

^b ASML US Inc   (United States)

Author keywords

APC; Etch; Integrated metrology; Intrafield innerfield wafermaps; Lithography; Process control; Scatterometry

Indexed keywords

CLOSED LOOP CONTROL SYSTEMS; ETCHING; FEEDBACK CONTROL; LIGHT SCATTERING; OPTIMIZATION; PROCESS CONTROL;

INTEGRATED METROLOGY; INTERFIELD WAFERMAPS; INTRAFIELD WAFERMAPS; SCATTEROMETRY;

PHOTOLITHOGRAPHY;

EID: 0141833198     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484987     Document Type: Conference Paper

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