Fabrication of three dimensional porous silicon distributed Bragg reflectors

Applied Physics Letters

Volumn 93, Issue 22, 2008, Pages

  Mangaiyarkarasi, D ^a   Breese, M B H ^a   Ow, Y S ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

BRAGG CELLS; BRAGG REFLECTORS; DISTRIBUTED BRAGG REFLECTORS; LIGHT REFLECTION; MICROMETERS; REFLECTION; SEMICONDUCTING SILICON COMPOUNDS; SILICON; THICKNESS MEASUREMENT; THREE DIMENSIONAL;

ANGULAR RANGES; INCIDENT WAVELENGTHS; MICROMETER DIMENSIONS; NAKED EYES; REFLECTION OF LIGHTS; REFLECTIVE SURFACES; SEMICONDUCTOR NANOCRYSTALS;

POROUS SILICON;

EID: 57349083144     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3040304     Document Type: Article

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16. See EPAPS Document No. E-APPLAB-93-003849 for more details on the (1) fabrication and (2) imaging conditions for the three dimensional pixels. For more information on EPAPS, see http://www/aip.org/pubservs/epaps.html.