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Volumn 16, Issue 17, 2008, Pages 12757-12803

Fabrication of large-area patterned porous silicon distributed Bragg reflectors

Author keywords

[No Author keywords available]

Indexed keywords

BRAGG REFLECTORS; OPTICAL COMMUNICATION; REFLECTION; SILICON; SILICON WAFERS;

EID: 50049084950     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.012757     Document Type: Article
Times cited : (35)

References (17)
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    • S. M. Weiss, H. Ouyang, J. Zhang, and P. M. Fauchet, Electrical and thermal modulation of silicon photonic bandgap microcavities containing liquid crystals," Opt. Express 13, 1090-1097 (2005)
  • 6
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    • Controlled blue-shift of the resonant wavelength in porous silicon microcavities using ion irradiation
    • D. Mangaiyarkarasi, M. B. H. Breese, Y. S. Ow, and C. Vijila, "Controlled blue-shift of the resonant wavelength in porous silicon microcavities using ion irradiation," Appl. Phys. Lett. 89, 021910 (2006).
    • (2006) Appl. Phys. Lett , vol.89 , pp. 021910
    • Mangaiyarkarasi, D.1    Breese, M.B.H.2    Ow, Y.S.3    Vijila, C.4
  • 7
    • 34247847994 scopus 로고    scopus 로고
    • Porous silicon Bragg reflectors with sub-micrometer lateral dimensions
    • M. B. H. Breese and D. Mangaiyarkarasi, "Porous silicon Bragg reflectors with sub-micrometer lateral dimensions," Opt. Express 15, 5537-5542 (2007).
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    • Breese, M.B.H.1    Mangaiyarkarasi, D.2
  • 8
    • 33144461127 scopus 로고    scopus 로고
    • Hole transport through proton-irradiated p-type silicon wafers during electrochemical anodisation
    • M. B. H. Breese, F. J. T. Champeaux, E. J. Teo, A. A. Bettiol, andD. Blackwood, "Hole transport through proton-irradiated p-type silicon wafers during electrochemical anodisation," Phys. Rev. B 73, 035428 (2006).
    • (2006) Phys. Rev. B , vol.73 , pp. 035428
    • Breese, M.B.H.1    Champeaux, F.J.T.2    Teo, E.J.3    Bettiol, A.A.4    andD5    Blackwood6
  • 10
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    • E. Rimini, Ion Implantation: Basics to Device Fabrication, (The International Series in Engineering and Computer Science, Springer 1994)
    • E. Rimini, Ion Implantation: Basics to Device Fabrication, (The International Series in Engineering and Computer Science, Springer 1994)
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    • Ion projection lithography: Status of tool and mask developments
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  • 16
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    • Measurement and correction of parasitic sextupole components in magnetic quadrupole lenses
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.