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Volumn 26, Issue 6, 2008, Pages 2064-2068
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Sub- 50 nm resolution surface electron emission lithography using nano-Si ballistic electron emitter
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMS;
BALLISTICS;
DIGITAL IMAGE STORAGE;
ELECTRIC CONDUCTIVITY;
ELECTRIC FIELDS;
ELECTROMAGNETIC FIELDS;
ELECTROMAGNETIC WAVES;
ELECTRON BEAM LITHOGRAPHY;
ELECTRON BEAMS;
ELECTRON OPTICS;
ELECTRON SOURCES;
ELECTRONS;
ELEMENTARY PARTICLE SOURCES;
EXPLOSIVES;
IMAGING SYSTEMS;
NANOCRYSTALLINE SILICON;
OPTOELECTRONIC DEVICES;
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTOR DEVICE MODELS;
SEMICONDUCTOR MATERIALS;
SILICON;
SILICON WAFERS;
TARGETS;
ACCELERATING VOLTAGES;
BALLISTIC ELECTRON TRANSPORTS;
BALLISTIC ELECTRONS;
CHROMATIC ABERRATIONS;
DEVICE FABRICATIONS;
EB LITHOGRAPHIES;
ELECTRON IMAGES;
ELECTRON IMAGING;
HIGH RESOLUTIONS;
HIGH THROUGHPUT LITHOGRAPHIES;
LOW COSTS;
NM RESOLUTIONS;
OUTER SURFACES;
PATTERNED SURFACES;
QUASIBALLISTIC ELECTRONS;
RESOLVING POWERS;
SEMICONDUCTOR SUBSTRATES;
SURFACE ELECTRONS;
THIN METALS;
SUBSTRATES;
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EID: 57249105008
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.2981068 Document Type: Article |
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Times cited : (30)
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References (9)
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