Ballistic electron surface-emitting cold cathode by porous polycrystalline silicon film formed on glass substrate

Materials Research Society Symposium - Proceedings

Volumn 638, Issue , 2001, Pages

  Komoda, Takuya ^a   Ichihara, Tsutomu ^a   Honda, Yoshiaki ^a   Aizawa, Koichi ^a   Koshida, Nobuyoshi ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; CHEMICAL VAPOR DEPOSITION; ELECTRIC CURRENT MEASUREMENT; ELECTROCHEMISTRY; ELECTRON EMISSION; ELECTRON TUNNELING; FLAT PANEL DISPLAYS; OXIDATION; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING GLASS; SEMICONDUCTOR DIODES; SUBSTRATES; THIN FILMS;

POROUS POLYCRYSTALLINE SILICON (PPS);

POROUS SILICON;

EID: 0035560123     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (20)