Femtosecond laser deposited zinc oxide film and its optical properties

Vacuum

Volumn 83, Issue 5, 2009, Pages 892-896

  Yang, Yifa ^a,b   Long, Hua ^a   Yang, Guang ^a   Chen, Aiping ^a   Zheng, Qiguang ^a   Lu, Peixiang ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b HUBEI NORMAL UNIVERSITY   (China)

Author keywords

Pulse laser deposition; X ray diffraction; Zinc oxide

Indexed keywords

DIFFRACTION; EMISSION SPECTROSCOPY; FIELD EMISSION; KRYPTON; LASERS; LIGHT; MICROSCOPIC EXAMINATION; OPTICAL MATERIALS; OPTICAL PROPERTIES; OXIDE FILMS; OXIDES; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; SILICON; SUBSTRATES; THICK FILMS; X RAY ANALYSIS; X RAY DIFFRACTION; ZINC; ZINC ALLOYS; ZINC OXIDE;

C -AXIS; FEMTOSECOND LASERS; FIELD EMISSION SCANNING ELECTRON MICROSCOPIES; GRAIN SIZES; HEXAGONAL STRUCTURES; LASER ENERGIES; NANO-SECONDS; OPTICAL TRANSMISSIVITY; PHOTOLUMINESCENCE SPECTRUMS; PULSE LASER DEPOSITION; PULSED LASERS; ROOM TEMPERATURES; SI (100) SUBSTRATES; SUBSTRATE TEMPERATURES; X-RAY DIFFRACTIONS; ZINC OXIDE FILMS; ZNO FILMS;

OPTICAL FILMS;

EID: 56949091092     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.10.001     Document Type: Article

References (18)

1. Dong B.Z., Fang G.J., Wang J.F., Guan W.J., and Zhao X.Z. J Appl Phys 101 (2007) 033713
2. Shan F.K., Liu G.X., Lee W.J., and Shin B.C. J Appl Phys 101 (2007) 053106
3. Tang Z.K., Yu P., Wang G.L., Kawasaki M., Ohtomo A., Koinuma H., et al. Solid State Commun 103 (1997) 459
4. Zhao J.L., Li X.M., Krtschil A., Krost A., Yu W.D., Zhang Y.W., et al. Appl Phys Lett 90 (2007) 062118
5. Zhang Y.B., Liu Q., Sritharan T., Gan C.L., and Li S. Appl Phys Lett 89 (2006) 042510
6. Park J.H., Jang S.J., Kim S.S., and Lee B.T. Appl Phys Lett 89 (2006) 121108
7. Zhang Y., Lin B.X., Sun X.K., and Fu Z.X. Appl Phys Lett 86 (2005) 131910
8. Sun J.W., Lu Y.M., Liu Y.C., Shen D.Z., Zhang Z.Z., Li B.H., et al. Appl Phys Lett 89 (2006) 232101
9. Abouzaid M., Ruterana P., Liu C., and Morkoc H. J Appl Phys 99 (2006) 113515
10. Duclère J.R., Doggett B., Henry M.O., McGlynn E., Rajendra Kumar R.T., Mosnier J.P., et al. J Appl Phys 101 (2007) 013509
11. Craciun V., Elders J., Gardeniers J.G.E., and Boyd I.W. Appl Phys Lett 65 (1994) 2963
12. Li M.Y., Anderson W., Chokshi N., DeLeon R.L., and Tompa G. J Appl Phys 100 (2006) 053106
13. Christoph M., and Volker E. Phys Rev Lett 73 (1994) 3207
14. Perriere J., Millona E., Seiler W., Leborgne C.B., Cracium V., Albert O., et al. J Appl Phys 91 (2002) 690
15. Okoshi M., Higashikawa K., and Hanabusa M. Jpn J Appl Phys 40 (2001) 1287
16. Takahashi J., Kawano S., and Shimada S. Jpn J Appl Phys 38 (1999) 493
17. Fan X.M., Lian J.S., Guo Z.X., and Lu H.J. Appl Surf Sci 239 (2005) 176
18. Fu Z.X., Guo C.X., Lin B.X., and Liao G.H. Chin Phys Lett 15 (1998) 457