R-curve determination for the initial stage of crack extension in Si 3N4

Journal of the American Ceramic Society

Volumn 91, Issue 11, 2008, Pages 3638-3642

  Fett, Theo ^a   Fünfschilling, Stefan ^a   Hoffmann, Michael J ^a   Oberacker, Rainer ^a   Jelitto, Hans ^b   Schneider, Gerold A ^b  

^a UNIVERSITY OF KARLSRUHE   (Germany)

^b HAMBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

NITRIDES; SILICON NITRIDE;

CRACK DEVELOPMENTS; CRACK EXTENSIONS; CRACK RESISTANCES; DISPLACEMENT MEASUREMENTS; INITIAL STAGES; NOTCH RADIUSES; NOTCH ROOT RADIUSES;

SILICON;

EID: 56749161125     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2008.02750.x     Document Type: Article

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