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Volumn 817, Issue , 2004, Pages 139-144

Structural properties of Si nanoclusters produced by thermal annealing of SiOx films

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; METALLIC FILMS; MOLECULAR STRUCTURE; OPTICAL SYSTEMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; QUANTUM THEORY; RAPID THERMAL ANNEALING; TRANSMISSION ELECTRON MICROSCOPY;

EID: 5644244397     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-817-l6.12     Document Type: Conference Paper
Times cited : (1)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.