|
Volumn 817, Issue , 2004, Pages 139-144
|
Structural properties of Si nanoclusters produced by thermal annealing of SiOx films
|
Author keywords
[No Author keywords available]
|
Indexed keywords
AMORPHOUS SILICON;
METALLIC FILMS;
MOLECULAR STRUCTURE;
OPTICAL SYSTEMS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
QUANTUM THEORY;
RAPID THERMAL ANNEALING;
TRANSMISSION ELECTRON MICROSCOPY;
ANNEALING TEMPERATURE;
ENERGY FILTERED TRANSMISSION ELECTRON MICROSCOPY (EFTEM);
NANOCLUSTERS;
QUANTUM CONFINEMENT;
NANOSTRUCTURED MATERIALS;
|
EID: 5644244397
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-817-l6.12 Document Type: Conference Paper |
Times cited : (1)
|
References (13)
|