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Volumn 19, Issue 43, 2008, Pages
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Nanocluster deposition for oxide thin film growth at near room temperature
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Author keywords
[No Author keywords available]
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Indexed keywords
ABS RESINS;
ASPECT RATIO;
CRYSTALLINE MATERIALS;
DEPOSITION;
FILM GROWTH;
LEAKAGE CURRENTS;
NANOCLUSTERS;
NANOSTRUCTURED MATERIALS;
NANOSTRUCTURES;
ORGANIC CHEMICALS;
ORGANIC COMPOUNDS;
ORGANIC POLYMERS;
OXIDE FILMS;
POLYMER FILMS;
POLYMERS;
PRESSURE DROP;
SUBSTRATES;
THICK FILMS;
THIN FILMS;
VAPORS;
CHEMICAL VAPOR REACTIONS;
CONFORMAL COATINGS;
CRYSTALLINE FILMS;
CRYSTALLINE NUCLEUSES;
DECOMPOSITION TEMPERATURES;
DIELECTRIC CONSTANTS;
FILM DEPOSITIONS;
FLEXIBLE ELECTRONIC DEVICES;
MORPHO-LOGIES;
NANOCLUSTER DEPOSITIONS;
NANOELECTRONIC DEVICES;
NANOSIZED;
NEAR ROOM TEMPERATURES;
ORGANIC CHEMICAL VAPOR DEPOSITIONS;
OXIDE THIN FILM GROWTHS;
OXIDE THIN FILMS;
POLYMER SUBSTRATES;
RATIO FEATURES;
REAL TEMPERATURES;
STEP COVERAGES;
SUBSTRATE HEATING;
SUBSTRATE SURFACES;
UNHEATED SUBSTRATES;
WORKING PRESSURES;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
OXIDE;
POLYMER;
ARTICLE;
CONTROLLED STUDY;
CRYSTALLIZATION;
DIELECTRIC CONSTANT;
FILM;
NANOARRAY;
NANODEVICE;
PRESSURE GRADIENT;
PRIORITY JOURNAL;
ROOM TEMPERATURE;
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EID: 56349159760
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/19/43/435305 Document Type: Article |
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Times cited : (15)
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References (16)
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