|
Volumn 94, Issue 1, 2009, Pages 117-122
|
The development of the physical and electrical characteristics of multi-layer TiO2-W-TiO2 thin films
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CRYSTAL STRUCTURE;
CRYSTALLOGRAPHY;
ENERGY GAP;
GALLIUM ALLOYS;
MAGNETRON SPUTTERING;
OXIDE MINERALS;
POWDERS;
THICK FILMS;
THIN FILM DEVICES;
THIN FILMS;
TITANIUM DIOXIDE;
TITANIUM OXIDES;
TUNGSTEN;
VAPOR DEPOSITION;
ANATASE TIO;
BAND GAPS;
CRYSTAL INTENSITIES;
ELECTRICAL CHARACTERISTICS;
GLASS SUBSTRATES;
LAYER STRUCTURES;
LAYER THIN;
MIDDLE LAYERS;
PHASE RATIOS;
RF MAGNETRON SPUTTERING;
RUTILE AND ANATASES;
X-RAY DIFFRACTIONS;
SOLIDS;
|
EID: 56349139495
PISSN: 09478396
EISSN: 14320630
Source Type: Journal
DOI: 10.1007/s00339-008-4682-0 Document Type: Article |
Times cited : (4)
|
References (15)
|