Characterization of iron doped titanium nitride thin films prepared by magnetron sputtering

Advanced Materials Research

Volumn 47-50 PART 2, Issue , 2008, Pages 1093-1096

  Lin, Wen Song ^a   Chen, Jing ^a   Zhou, Ji ^a  

^a SHANGHAI UNIVERSITY OF ENGINEERING SCIENCE   (China)

Author keywords

Doped; Magnetic film; Magnetron sputtering; TiN

Indexed keywords

CRYSTAL STRUCTURE; ELECTRIC RESISTANCE; FERROMAGNETIC MATERIALS; FERROMAGNETISM; FUNCTIONAL MATERIALS; IRON COMPOUNDS; MAGNETIC FILMS; MAGNETRON SPUTTERING; METALLIC FILMS; SATURATION MAGNETIZATION; SUBSTRATES; THIN FILMS; TIN; TITANIUM NITRIDE; X RAY DIFFRACTION; AMORPHOUS FILMS; CHARACTERIZATION; IRON; TITANIUM;

ADDITIONAL ANNEALING; AS-DEPOSITED FILMS; DOPED; FERROMAGNETIC PROPERTIES; FOUR-PROBE METHODS; TITANIUM NITRIDE FILMS; TITANIUM NITRIDE THIN FILMS; VIBRATING SAMPLE MAGNETOMETER;

FILM PREPARATION;

EID: 56349138979     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/amr.47-50.1093     Document Type: Conference Paper

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