Modeling the reactive ion etching process for the CoO(001) surface via first principles calculations

Journal of Physics Condensed Matter

Volumn 20, Issue 35, 2008, Pages

  Ozawa, Nobuki ^a   Roman, Tanglaw ^a   David, Melanie ^a   Kishi, Hirofumi ^a   Kasai, Hideaki ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT COMPOUNDS; ETCHING;

ETCHING PROCESSES; FINAL STATES; FIRST-PRINCIPLES CALCULATIONS; GAS COMBINATIONS; INTERMEDIATE STATES; LDA + U METHODS; LOCAL DENSITIES; REACTION PRODUCTS; REACTIVE GASSES; REACTIVE IONS; TOTAL ENERGIES; VIA FIRSTS;

REACTIVE ION ETCHING;

EID: 56349088358     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/20/35/355006     Document Type: Article

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