A plasma model combined with an improved two-temperature equation for ultrafast laser ablation of dielectrics

Journal of Applied Physics

Volumn 104, Issue 9, 2008, Pages

  Jiang, Lan ^a,b   Tsai, Hai Lung ^b  

^a BEIJING INSTITUTE OF TECHNOLOGY   (China)

^b MISSOURI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CHEMICAL ELEMENTS; ELECTRON DENSITY MEASUREMENT; ELECTRONS; EXPERIMENTS; FUSED SILICA; LASER ABLATION; LASER APPLICATIONS; LASERS; PLASMAS; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SILICA; ULTRASHORT PULSES;

ABLATION DEPTHS; ABLATION THRESHOLDS; COMPARISON STUDIES; COULOMB EXPLOSIONS; EXPERIMENTAL CONFIRMATIONS; EXPERIMENTAL DATUMS; FEMTOSECOND LASER ABLATIONS; FREE ELECTRONS; MATERIAL REMOVAL MECHANISMS; NONTHERMAL PROCESSES; PHASE CHANGE MECHANISMS; PLASMA MODELS; TEMPERATURE MODELS; THRESHOLD FLUENCE; ULTRAFAST LASER ABLATIONS;

ABLATION;

EID: 56349084764     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3006129     Document Type: Article

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