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Volumn 5, Issue 9, 2008, Pages 3138-3140
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An approach for single crystalline zinc oxide thin films with fine channel mist chemical vapor deposition method
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION METHODS;
FINE-CHANNEL;
HIGH PARTIAL PRESSURE;
HIGH QUALITY;
IN-PLANE;
LOW DENSITY;
MIST CVD;
SINGLE-CRYSTALLINE;
SINGLE-CRYSTALLINE STRUCTURES;
WATER SOLUTIONS;
ZINC ACETATE;
ZINC OXIDE THIN FILMS;
ZNO THIN FILM;
CRYSTALLINE MATERIALS;
DEPOSITION;
METALLIC FILMS;
OPTICAL FILMS;
OXIDE FILMS;
OXYGEN;
OXYGEN VACANCIES;
SEMICONDUCTOR GROWTH;
THIN FILMS;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
ZINC;
ZINC OXIDE;
CHEMICAL VAPOR DEPOSITION;
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EID: 56249141900
PISSN: 18626351
EISSN: 16101642
Source Type: Journal
DOI: 10.1002/pssc.200779305 Document Type: Conference Paper |
Times cited : (33)
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References (6)
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