Bulk- micromachined dielectric tunable optical filter realized with inductively coupled plasma chemical vapour deposition

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7101, Issue , 2008, Pages

  Jatta, Sandro ^a   Haberle, Klaus ^a   Singh, Kuldip ^b   Koegel, Benjamin ^a   Halbritter, Hubert ^a   Meissner, Peter ^a  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^b CENTRAL ELECTRONICS ENGINEERING RESEARCH INSTITUTE   (India)

Author keywords

Bulk micromachining; ICPCVD; MOEMS; PECVD; Silicon nitride; Silicon oxide; Tunable optical filter

Indexed keywords

BANDPASS FILTERS; DEPOSITION RATES; DIELECTRIC FILMS; FIBER OPTIC SENSORS; FLOW OF GASES; HYDROFLUORIC ACID; INDUCTIVELY COUPLED PLASMA; MOEMS; NITRIDES; OPTICAL FILTERS; OXIDE FILMS; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILICON NITRIDE; SILICON OXIDES; TEMPERATURE; THIN FILMS;

BULK- MICROMACHINING; CHEMICAL VAPOUR DEPOSITION; DEPOSITION CHARACTERISTICS; DEPOSITION TEMPERATURES; FULL WIDTH HALF MAXIMUM; ICP-CVD; THIN DIELECTRIC FILM; TUNABLE OPTICAL FILTERS;

OPTICAL FILMS;

EID: 56249128279     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.797755     Document Type: Conference Paper

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