An in-situ investigation of the surface oxidation of ultra-thin films of Ni and Hf

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7101, Issue , 2008, Pages

  Song, Shigeng ^a   Placido, Frank ^a  

^a UNIVERSITY OF THE WEST OF SCOTLAND   (United Kingdom)

Author keywords

Hf; HfOx; Metal oxidation; Ni; NiOx; Optical monitoring; Thin films

Indexed keywords

CHEMICAL OXYGEN DEMAND; ELECTROMAGNETIC WAVES; HAFNIUM; HAFNIUM COMPOUNDS; METALLIC COMPOUNDS; METALLIC FILMS; METALS; MICROWAVES; NICKEL; NICKEL ALLOYS; NONMETALS; OPTICAL PROPERTIES; OXIDATION; OXIDE FILMS; OXYGEN; PLASMA APPLICATIONS; PLASMAS; REFLECTION; SOLIDS; THICK FILMS; THIN FILMS;

HF; HFOX; METAL OXIDATION; NI; NIOX; OPTICAL MONITORING;

OPTICAL FILMS;

EID: 56249124286     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.803870     Document Type: Conference Paper

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