Property of the nano-thick TiO2 films using an ALD at low temperature

Korean Journal of Materials Research

Volumn 18, Issue 10, 2008, Pages 515-520

  Yoon, Kijeong ^a   Song, Ohsung ^a  

^a University of Seoul   (South Korea)

Author keywords

ALD; Dye sensitized solar cell; Low temperature; Nano thickness; TiO2

Indexed keywords

ABSORPTION; ATOMS; BINDING ENERGY; BINDING SITES; ELECTROLYSIS; ENERGY GAP; GALLIUM ALLOYS; INFRARED DEVICES; NUCLEAR ENERGY; OXIDE MINERALS; PHOTOVOLTAIC CELLS; PHYSICAL VAPOR DEPOSITION; POTENTIAL ENERGY; PULSED LASER DEPOSITION; SOLAR CELLS; SOLAR ENERGY; SOLAR EQUIPMENT; SOLIDS; THICK FILMS; THIN FILM DEVICES; THIN FILMS; TITANIUM DIOXIDE; TITANIUM OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

ALD; DYE SENSITIZED SOLAR CELL; LOW TEMPERATURE; NANO-THICKNESS; TIO2;

ATOMIC LAYER DEPOSITION;

EID: 55949102680     PISSN: 12250562     EISSN: None     Source Type: Journal    
DOI: 10.3740/MRSK.2008.18.10.515     Document Type: Article

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