Self-extrusion of Te nanowire from Si-Sb-Te thin films

Applied Physics Letters

Volumn 93, Issue 18, 2008, Pages

  Cheng, Y ^a   Han, X D ^a   Liu, X Q ^a   Zheng, K ^a   Zhang, Z ^a   Zhang, T ^b   Song, Z T ^b   Liu, B ^b   Feng, S L ^b  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

^b SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRIC WIRE; ELECTRON BEAMS; NANOSTRUCTURES; NANOWIRES; SEMICONDUCTING SILICON COMPOUNDS; SILICON; TELLURIUM; TELLURIUM COMPOUNDS; THICK FILMS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

DECOMPOSITION PROCESSES; ELECTRON BEAM FLUXES; INTERESTING MODELS; OUT-FLOWS; ROOM TEMPERATURES; TE NANOWIRES; TRANSMISSION ELECTRON MICROSCOPES;

NANOSTRUCTURED MATERIALS;

EID: 55849119877     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3013513     Document Type: Article

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