Polarization effects in immersion lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 4, Issue 3, 2005, Pages

  Adam, Konstantinos ^a   Maurer, Wilhelm ^b  

^a MENTOR GRAPHICS CORPORATION   (United States)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Hopkins imaging; Immersion lithography; Polarization; Sum of coherent systems approximation; Vector diffraction theory

Indexed keywords

HOPKINS IMAGING; IMMERSION LITHOGRAPHY; SUM-OF-COHERENT-SYSTEMS APPROXIMATION; VECTOR DIFFRACTION THEORY;

COMPUTER SIMULATION; COMPUTER SOFTWARE; DIFFRACTION; IMAGING SYSTEMS; LINEARIZATION; POLARIZATION;

LITHOGRAPHY;

EID: 33644786247     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2038687     Document Type: Article

References (13)

1. K. Adam, Y. Granik, A. Torres, and N. Cobb, "Improved modeling performance with an adapted vectorial formulation of the Hopkins imaging equations," Proc. SPIE 5040, 78-91 (2003).
2. D. G. Flagello, T. Milster, and A. E. Rosenbluth, "Theory of high-NA imaging in homogeneous thin films," J. Opt. Soc. Am. A 13(1), 53-64 (1996).
3. M. S. Yeung, D. Lee, R. Lee, and A. R. Neureuther, "Extension of the Hopkins theory of partially coherent imaging to include thin-film interference effects," Proc. SPIE 1927, 452-463 (1993).
4. E. Wolf, "Electromagnetic diffraction in optical systems I. An integral representation of the image field," Proc. R. Soc. London, Ser. A A253, 349-357 (1959).
5. B. Richards and E. Wolf, "Electromagnetic diffraction in optical systems II. Structure of the image field in an aplanatic system," Proc. R. Soc. London, Ser. A A253, 358-379 (1959).
6. M. Mansuripur, "Distribution of light at and near the focus of high numerical aperture objectives," J. Opt. Soc. Am. A 3, 2086-2093 1986).
7. H. H. Hopkins, "On the diffraction theory of optical images," Proc. R. Soc. London, Ser. A A217, 408-432 (1953).
8. N. Cobb, A. Zakhor, and E. Miloslavsky, "Mathematical and CAD framework for proximity correction," Proc. SPIE 2726, 208-222 (1996).
9. A. K. K. Wong, Resolution Enhancement Techniques in Optical Lithography, Vol. TT47, p. 63, SPIE Press, Bellingham, WA (2001).
10. B. Streefkerk et al., "Extending optical lithography with immersion," Proc. SPIE 5377, 285-305 (2004).
11. D. C. Cole, E. Barouch, U. Hollerbach, and S. A. Orszag, "Extending scalar aerial image calculations to higher numerical apertures," J. Vac. Sci. Technol. B 10(6), 3037-3041 (1992).
12. H. Ling and S. Lee, "Focusing of electromagnetic waves through a dielectric interface," J. Opt. Soc. Am. A 1(9), 965-973 (1984).
13. R. Socha, Propagation Effects of Partially Coherent Light in Optical Lithography and Inspection, Chap. 8, Electronics Research Laboratory, University of California, Berkeley (1997).