Textured silicon surface passivation by high-rate expanding thermal plasma deposited SiN and thermal SiO2/SiN stacks for crystalline silicon solar cells

Progress in Photovoltaics: Research and Applications

Volumn 16, Issue 7, 2008, Pages 615-627

  Van Erven, A J M ^a   Bosch, R C M ^a   Bijker, M D ^a  

^a OTB Solar   (Netherlands)

Author keywords

Firing; Silicon nitride; Silicon oxide; Surface passivation; Texturization

Indexed keywords

ANTIREFLECTION COATINGS; HEAT TREATMENT; NITRIDES; NONMETALS; OPTICAL PROPERTIES; PASSIVATION; PHOTOVOLTAIC CELLS; PLASMA DEPOSITION; PLASMAS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON COMPOUNDS; SILICON NITRIDE; SILICON SOLAR CELLS; SOLAR CELLS; SOLAR ENERGY; SOLAR EQUIPMENT;

BEFORE AND AFTER; CRYSTALLINE SILICON SOLAR CELLS; EXPANDING THERMAL PLASMAS; FILM CHARACTERIZATIONS; FIRING; MONOCRYSTALLINE SILICON WAFERS; OPTICAL-; OXIDE PASSIVATIONS; PASSIVATION LAYERS; SATURATION CURRENT DENSITIES; SILICON NITRIDE (SIN; SILICON OXIDE; SIN FILMS; SIN LAYERS; SINGLE LAYERS; STACK SYSTEMS; SURFACE PASSIVATION; SURFACE PASSIVATIONS; TEXTURED SILICON SURFACES; TEXTURIZATION; THERMAL TREATMENTS;

SILICON WAFERS;

EID: 55649084889     PISSN: 10627995     EISSN: 1099159X     Source Type: Journal    
DOI: 10.1002/pip.841     Document Type: Article

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