Photoresponsive surfaces with two independent wavelength-selective functional levels

Langmuir

Volumn 24, Issue 20, 2008, Pages 11872-11879

  Stegmaier, Petra ^a   Alonso, José María ^a   Del Campo, Aránzazu ^a,b  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^b INM LEIBNIZ INSTITUTE FOR NEW MATERIALS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMINES; CHEMICAL MODIFICATION; FLUORESCENCE; FLUORESCENCE MICROSCOPY; IRRADIATION; LIGHT EMISSION; LUMINESCENCE; MICROSCOPIC EXAMINATION; ORGANIC COMPOUNDS; SILANES; SILICA; SILICON COMPOUNDS;

AMINE GROUPS; AMINO PROPYL TRIETHOXY SILANES; BIFUNCTIONAL; COLOR PATTERNS; DEPROTECTION REACTIONS; FLUORESCENT DYES; FUNCTIONAL LEVELS; IRRADIATION CONDITIONS; IRRADIATION PROCESSES; MOLAR MIXTURES; PHOTORESPONSIVE; PHOTOSENSITIVE LAYERS; PROTECTING GROUPS; SILICA SURFACES; UV LIGHTS; UV MEASUREMENTS;

CHROMOPHORES;

FLUORESCENT DYE; SILANE DERIVATIVE;

ARTICLE; CHEMICAL MODEL; CHEMISTRY; EQUIPMENT DESIGN; FLUORESCENCE; FLUORESCENCE MICROSCOPY; LIGHT; METHODOLOGY; PHOTOCHEMISTRY; PHYSICAL CHEMISTRY; SURFACE PROPERTY; ULTRAVIOLET RADIATION; ULTRAVIOLET SPECTROPHOTOMETRY;

CHEMISTRY, PHYSICAL; EQUIPMENT DESIGN; FLUORESCENCE; FLUORESCENT DYES; LIGHT; MICROSCOPY, FLUORESCENCE; MODELS, CHEMICAL; PHOTOCHEMISTRY; SILANES; SPECTROPHOTOMETRY, ULTRAVIOLET; SURFACE PROPERTIES; ULTRAVIOLET RAYS;

EID: 55549100593     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la802052u     Document Type: Article

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