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Volumn 40, Issue 11, 2001, Pages 2071-2073

Orthogonal Photolysis of Protecting Groups

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EID: 0001368167     PISSN: 14337851     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3773(20010601)40:11<2071::AID-ANIE2071>3.0.CO;2-9     Document Type: Article
Times cited : (112)

References (20)
  • 3
    • 0001115594 scopus 로고    scopus 로고
    • c) M. Schelhaas, H. Waldmann, Agew. Chem. 1996, 108, 2192-2219; Angew. Chem. Int. Ed. Engl. 1996, 35, 2056- 2083;
    • (1996) Agew. Chem. , vol.108 , pp. 2192-2219
    • Schelhaas, M.1    Waldmann, H.2
  • 4
    • 0029799743 scopus 로고    scopus 로고
    • c) M. Schelhaas, H. Waldmann, Agew. Chem. 1996, 108, 2192-2219; Angew. Chem. Int. Ed. Engl. 1996, 35, 2056-2083;
    • (1996) Angew. Chem. Int. Ed. Engl. , vol.35 , pp. 2056-2083
  • 17
    • 85037271334 scopus 로고    scopus 로고
    • note
    • The typical concentrations were between 1 and 10 mM. The irradiations were performed in a Rayonet apparatus.
  • 18
    • 85037272362 scopus 로고    scopus 로고
    • note
    • By reactivity, we mean the net reaction rate under specific conditions; it includes the quantum yield, the absorbance at the wavelength, and all the experimental parameters.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.