Optically defined chemical functionalization of silicon nanomechanical resonators for mass sensing

2008 8th IEEE Conference on Nanotechnology, IEEE-NANO

Volumn , Issue , 2008, Pages 139-142

  Baldwin, Jeffrey W ^a   Zalalutdinov, Maxim K ^b   Pate, Bradford B ^a   Martin, Michael J ^a   Houston, Brian H ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

^b SFA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTES; CHANNEL WALLS; CHEMICAL FUNCTIONALIZATION; FUNCTIONALIZATION; MASS SENSING; MEDIATED REACTIONS; NANOMECHANICAL RESONATORS; NANOMECHANICAL SYSTEMS; POLYCRYSTALLINE SILICONS; SELECTIVE SURFACE FUNCTIONALIZATION; SILICON NANOMECHANICAL RESONATORS; SILICON SURFACES; SPIN CASTS; STRUCTURAL ELEMENTS; TERMINAL ALKENES;

ABS RESINS; ELECTRON ENERGY LEVELS; FUNCTIONAL GROUPS; HYDROCARBONS; HYDROGEN; NANOTECHNOLOGY; OLEFINS; POLYMERS; POLYSILICON; RESONATORS; SILICON; VAPORS;

POLYMER FILMS;

EID: 55349145977     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NANO.2008.48     Document Type: Conference Paper

References (20)

1. K. L. Ekinci, H.X. Huang, M. L. Roukes, M. L. Appl. Phys. Lett. vol. 84, pp. 4469-4471, 2004.
2. Y. T. Yang, C. Callegari, X. L. Feng, K. L. Ekinci, and M. L. Roukes Nano Lett, vol. 6, pp. 583-586, 2006.
3. J. F. Vignola, J. A. Judge, J. Jarzynski, M. Zalalutdinov, B. H. Houston, J. W. Baldwin Appl. Phys. Lett., vol. 88, 041921, 2006.
4. Y. K. Yong, J. R. Vig IEEE Trans. Ultrason., Ferroelectr. Freq. Control, vol. 36, pp. 452-458, 1989.
5. M.R. Linford, P. Fenter, P.M. Eisenberger, C.E.D. Chidsey J. Am. Chem. Soc., vol. 117, pp. 3145-3155, 1995. T. Strother, W. Cai, X. Zhao, R. J. Hamers, and L.M. Smith J. Am. Chem. Soc., vol. 122, pp. 1205-1209, 2000.
6. Wagner, P.; Nock, S.; Spudich, J. A.; Volkmuth, W. D.; Chu, S.; Cicero, R. L.; Wade, C. P.; Linford, M. R.; Chidsey, C. E. D. J. Struct. Biol., vol. 119, pp. 189-201, 1997.
7. Sieval, A. B.; Demirel, A. L.; Nissink, J. W. M.; Linford, M. R.;van der Mass, J. H.; de Jeu, W. H.; Zuilhof, H.; Sudholter, E. J. R. Langmuir, vol. 14, pp. 1759-1768, 1998.
8. Terry, J.; Linford, M. R.; Wigren, C.; Cao, R.; Pianetta, P.; Chidsey C. E. D. J. Appl. Phys., vol. 85, pp. 213-221, 1999.
9. Hamers, R. J.; Hovis, J. S.; Seung, L.; Liu, H.; Shan, J. J. Phys. Chem. B, vol. 101, pp. 1489-1492, 1997.
10. A.W. Snow, L.G. Sprague, R.L. Soulen, J.W. Grate, and H. Wohltjen J. Appl. Poly. Sci., vol. 43, pp. 1659-1671, 1991.
11. M.K. Zalalutdinov, J.W. Baldwin, M.H. Marcus, R.B. Reichenback, J.M. Parpia, and B.H. Houston Appl. Phys. Lett. vol. 88, 143504, 2006.
12. M.J. Martin, B.H. Houston, J.W. Baldwin, M.K. Zalalutdinov J. Microelectromech. Syst. vol 17, pp. 503-511, April 2008.
13. M. J. Martin and B. H. Houston, Appl. Phys. Lett., Vol. 91(10), 103116, 2007.
14. V. Sazonova, Y. Yalsh, I. Ustunel, D. Roundy, T. A. Arias, and P. L. McEuen Nature, vol. 431, pp. 284-287, 2004.
15. F. R. Blom, S. Bouwstra, M. Elwenspoek, and J. H. J. Fluitman, J. Vac. Sci. Tech. B, vol. 10, pp. 19-26, 1992.
16. R. B. Bhiladvala and Z. J. Wang, Phys. Rev. E, vol. 69, 036307, 2004.
17. S. D. Senturia, Microsystem Design. Boston, MA: Kluwer Academic Publishing, 2001.
18. G. A. Bird, Molecular Gas Dynamics and the Simulation of Gas Flows. Oxford, UK: Clarendon Press, 1994.
19. M.K. Ghatkesar, et al. Nanotechnology, vol. 18, 445502, 2007.
20. R Hesse, T. Chasse, R Szargan,. J. Fresenius Anal. Chem., vol. 365, pp. 48-54, 1999.