Nonadiabatic simulation study of photoisomerization of azobenzene: Detailed mechanism and load-resisting capacity

Journal of Chemical Physics

Volumn 129, Issue 16, 2008, Pages

  Shao, Junfeng ^a   Lei, Yibo ^b   Wen, Zhenyi ^b   Dou, Yusheng ^b,c   Wang, Zhisong ^a,d  

^a FUDAN UNIVERSITY   (China)

^b CHONGQING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^c NICHOLLS STATE UNIVERSITY   (United States)

^d NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DYNAMICS; ELECTRON TRANSITIONS; ISOMERS; LASERS; MECHANISMS; PULSED LASER APPLICATIONS; ROTATION; STRUCTURAL DYNAMICS;

AZOBENZENE MOLECULES; CO EVOLUTIONS; DYNAMICAL SIMULATIONS; ELECTRONIC DYNAMICS; EXTERNAL FORCES; EXTERNAL-; INVERSION MECHANISMS; ION DYNAMICS; LASER IRRADIATIONS; MECHANICAL LOADS; NANOMECHANICAL DEVICES; NONADIABATIC; PLANE ROTATIONS; RESISTING FORCES; SIMULATION STUDIES; TRANS ISOMERIZATION; TRANS STATES; ULTRA FASTS;

ISOMERIZATION;

AZO COMPOUND; AZOBENZENE;

ARTICLE; CHEMICAL MODEL; CHEMISTRY; ELECTRON; HEAT; LASER; MECHANICAL STRESS; PHOTOCHEMISTRY; STEREOISOMERISM;

AZO COMPOUNDS; ELECTRONS; HOT TEMPERATURE; LASERS; MODELS, CHEMICAL; PHOTOCHEMICAL PROCESSES; STEREOISOMERISM; STRESS, MECHANICAL;

EID: 55349125313     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3000008     Document Type: Article

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