Compact soft x-ray microscope using a gas-discharge light source

Optics Letters

Volumn 33, Issue 20, 2008, Pages 2359-2361

  Benk, Markus ^a   Bergmann, Klaus ^a   Schäfer, David ^b   Wilhein, Thomas ^b  

^a FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

^b UNIVERSITY OF APPLIED SCIENCES KOBLENZ   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; GAS DISCHARGE TUBES; LIGHT; LIGHT SOURCES; PHOTONS; RAY TRACING;

ELECTRODE GEOMETRIES; GAS DISCHARGE LIGHT SOURCES; GAS-DISCHARGE PLASMAS; GRAZING INCIDENCE COLLECTORS; PROOF-OF-PRINCIPLE EXPERIMENTS; RADIANT INTENSITIES; RAY TRACING SIMULATION; SOFT X-RAY MICROSCOPY;

X RAY MICROSCOPES;

HELIUM; LATEX; NITROGEN; TITANIUM;

ARTICLE; CHEMISTRY; EQUIPMENT DESIGN; GAS; INSTRUMENTATION; LASER; LIGHT; METHODOLOGY; MICROSCOPY; OPTICAL INSTRUMENTATION; OPTICS; PHOTON; REFRACTOMETRY; X RAY;

EQUIPMENT DESIGN; GASES; HELIUM; LASERS; LATEX; LENSES; LIGHT; MICROSCOPY; NITROGEN; OPTICS AND PHOTONICS; PHOTONS; REFRACTOMETRY; TITANIUM; X-RAYS;

EID: 55349096785     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.33.002359     Document Type: Article

References (10)

1. A. Glišović, J. Thieme, P. Guttmann, and T. Salditt, Int. J. Biol. Macromol. 40, 87 (2007).
2. J. Rothe, M. A. Denecke, and K. Dardenne, J. Colloid Interface Sci. 231, 91 (2000).
3. P. Guttmann, S. Rudolph, S. Heim, S. Rehbein, M. A. Meyer, G. Schneider, and E. Zschech, in Proceedings of the 8th International Conferance on X-ray Microscopy, S. Aoki, Y. Kagoshima, and Y. Suzuki, eds., IPAP Conference Series 7 (Institute of Pure and Applied Physics, 2006), pp. 243-245.
4. W. Chao, B. D. Harteneck, J. A. Liddle, E. H. Anderson, and D. T. Attwood, Nature 435, 1210 (2005).
5. C. Xiao, P. R. Chipman, A. J. Battisti, V. D. Bowman, P. Renesto, D. Raoult, and M. G. Rossmann, Mol. Biol. 353, 493 (2005).
6. P. Guttmann, B. Niemann, S. Rehbein, C. Knöchel, D. Rudolph, and G. Schmahl, J. Phys. IV 104, 91 (2003).
7. P. Guttmann, B. Niemann, J. Thieme, U. Wiesemann, D. Rudolph, and G. Schmahl, in X-ray Microscopy, Proceedings of the Sixth International Conference, W. Meyer-Ilse, T. Warwick, and D. Attwood, eds., AIP Conference Proceeding 507(American Institute of Physics, 2000), pp. 411-415.
8. P. A. C. Jansson, U. Vogt, and H. M. Hertz, Rev. Sci. Instrum. 76, 043503 (2005).
9. J. Pankert, K. Bergmann, R. Wester, J. Klein, W. Neff, O. Rosier, S. Seiwert, C. Smith, S. Probst, D. Vaudrevange, G. Siemons, R. Apetz, J. Jonkers, M. Loeken, G. Derra, T. Krücken, and P. Zink, in EUV Sources for Lithography, V. Bakshi, ed. (SPIE, 2005), pp. 395-411.
10. K. Bergmann, F. Küpper, and M. Benk, J. Appl. Phys. 103, 123304 (2008).