Microcrystalline piezoresistive polysilicon film obtained by aluminum induced crystallization

2008 8th IEEE Conference on Nanotechnology, IEEE-NANO

Volumn , Issue , 2008, Pages 767-770

  Patil, Suraj K ^a   Ĉelik Butler, Zeynep ^a   Butler, Donald P ^a  

^a University of Texas at Arlington   (United States)

Author keywords

Aluminum induced crystallization; Flexible substrate; Gauge factor; Piezoresistance; Polysilicon thin film

Indexed keywords

ALUMINA; ALUMINUM; AMORPHOUS MATERIALS; AMORPHOUS SILICON; ANNEALING; CRYSTALLIZATION; LIGHT METALS; METALLIC FILMS; NANOCRYSTALLINE ALLOYS; NANOTECHNOLOGY; POLYCRYSTALLINE MATERIALS; POLYSILICON; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SUBSTRATES; THICK FILMS;

AMORPHOUS SILICON FILMS; BUDGET CONSTRAINTS; DEPOSITION TECHNIQUES; ELECTRICAL CHARACTERIZATIONS; FABRICATION TECHNIQUES; FLEXIBLE SUBSTRATE; GAUGE FACTOR; HIGH CONDUCTIVITIES; HIGH TEMPERATURES; INDUCED CRYSTALLIZATIONS; LARGE GRAINS; PIEZORESISTANCE; PIEZORESISTIVE; PIEZORESISTIVE PROPERTIES; POLYCRYSTALLINE SILICON FILMS; POLYCRYSTALLINE SILICONS; POLYCRYSTALLINE STRUCTURES; POLYSILICON FILMS; POLYSILICON THIN FILM;

AMORPHOUS FILMS;

EID: 55349089220     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NANO.2008.229     Document Type: Conference Paper

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