Structure, conformation, and UV absorption behavior of partially trimethylsilylated oligosilane chains

Organometallics

Volumn 27, Issue 20, 2008, Pages 5221-5229

  Wallner, Andreas ^b   Wagner, Harald ^b   Baumgartner, Judith ^b   Marschner, Christoph ^a   Rohm, Henning W ^b   Köckerling, Martin ^b   Krempner, Clemens ^b  

^a GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^b UNIVERSITY OF ROSTOCK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; SILANES; SILICON; SPECTROSCOPIC ANALYSIS; ULTRAVIOLET SPECTROSCOPY;

DELOCALIZATION; DIMETHYLSILYLENE; ELIMINATION REACTIONS; LINEAR SEGMENTS; OLIGOSILANES; SILICON ATOMS; SILYLENE; STERIC INTERACTIONS; TRIMETHYLSILYL; TRIMETHYLSILYL GROUPS; TRIMETHYLSILYLATED; UV ABSORPTIONS; X-RAY DIFFRACTIONS;

X RAY DIFFRACTION ANALYSIS;

EID: 55249093915     PISSN: 02767333     EISSN: None     Source Type: Journal    
DOI: 10.1021/om8004383     Document Type: Article

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