Low-temperature chemical vapor deposition of anatase TiO2 with titanium tetraisopropooxide and H2O2 vapor

Japanese Journal of Applied Physics

Volumn 47, Issue 7 PART 1, 2008, Pages 5619-5622

  Hirose, Fumihiko ^a   Ito, Masashi ^a   Kurita, Kazunari ^b  

^a YAMAGATA UNIVERSITY   (Japan)

^b NONE   (Japan)

Author keywords

Anatase; CVD; Low temperature; TiO2

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; PHOTOCATALYSIS; POLYIMIDES; POLYMERS; SILICON; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; VAPORS;

AMORPHOUS NETWORKS; ANATASE; ANATASE TIO; ATMOSPHERIC CHEMICAL VAPOR DEPOSITIONS; CARBON IMPURITIES; CVD; FLEXIBLE POLYIMIDES; LOW TEMPERATURE; PHOTOCATALYTIC ACTIVITIES; POLYCRYSTAL LINES; SI (100) SUBSTRATES; TEMPERATURE DEPOSITIONS; TIO2;

ATMOSPHERIC TEMPERATURE;

EID: 55149096577     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.5619     Document Type: Article

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