Influence of Ar and NH3 plasma treatment on surface of poly(monochloro-para-xylylene) dielectric films processed in oxygen plasma

Japanese Journal of Applied Physics

Volumn 47, Issue 8 PART 3, 2008, Pages 6970-6973

  Shutov, Dmitriy A ^a,c   Kang, Seung Youl ^b   Baek, Kyu Ha ^b   Suh, Kyung Soo ^b   Kwon, Kwang Ho ^c  

^a IVANOVO STATE UNIVERSITY OF CHEMISTRY AND TECHNOLOGY   (Russian Federation)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^c Korea University   (South Korea)

Author keywords

Ammonia; Argon; Oxygen; Parylene C; Plasma; Recovering; Surface

Indexed keywords

ABS RESINS; AMMONIA; ARGON; CONTACT ANGLE; DIELECTRIC FILMS; INERT GASES; OXYGEN; PHOTOELECTRON SPECTROSCOPY; PLASMA APPLICATIONS; PLASMAS; POLYMERS; WATER TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

AMMONIA PLASMAS; OXIDIZED SURFACES; OXYGEN PLASMAS; PARYLENE; PARYLENE-C; PLASMA TREATMENTS; POLAR GROUPS; POLYMER LEDS; POLYMER SURFACES; RECOVERING; WATER CONTACT ANGLES; X-RAY PHOTOELECTRON SPECTROSCOPIES;

SURFACE TREATMENT;

EID: 55149090907     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.6970     Document Type: Article

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