Focused-ion-beam-based selective closing and opening of anodic alumina nanochannels for the growth of nanowire arrays comprising multiple elements

Advanced Materials

Volumn 20, Issue 13, 2008, Pages 2547-2551

  Liu, Nai Wei ^b   Liu, Chih Yi ^a   Wang, Huai Hsien ^a,b   Hsu, Chen Feng ^a   Lai, Ming Yu ^a   Chuang, Tung Han ^b   Wang, Yuh Lin ^a,b  

^a INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ELECTRIC WIRE; FOCUSED ION BEAMS; IMAGE ANALYSIS; ION BEAMS; IONS; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NANOWIRES; WATER POLLUTION;

AG NANOWIRES; ANALYSIS RESULTS; ANODIC ALUMINAS; ANODIC ALUMINUM OXIDES; CAPPING LAYERS; DIRECT WRITINGS; ION DOSES; LARGE SIZES; LITHOGRAPHIC PROCESSES; MULTIPLE ELEMENTS; NANOCHANNELS; NANOWIRE ARRAYS; ORDERED ARRAYS; PORE DIAMETERS; STANDARD DEVIATIONS;

ION BOMBARDMENT;

EID: 54949155526     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200702604     Document Type: Article

References (22)

1. W. C. Yoo, J. K. Lee, Adv. Mater. 2004, 16, 1097.
2. J. Choi, G. Sauer, K. Nielsch, R. B. Wehrspohn, U. Gösele, Chem. Mater. 2003, 15, 776.
3. R. Sanz, A. Johansson, M. Skupinski. J. Jensen, G. Possnert, M. Boman, M. Vazquez, K. Hjort, Nano Lett. 2006, 6, 1065.
4. H. Masuda, A. Abe, M. Nakao, A. Yokoo, T. Tamamura, K. Nishio, Adv. Mater. 2003, 14, 161.
5. F. Mastumoto, M. Harada, K. Nishio, H. Masuda, Adv. Mater. 2005, 17, 1609.
6. K. L. Hobbs, P. R. Larson, G. D. Lian, J. C. Keay, M. B. Johnson, Nano Lett. 2004, 4, 167.
7. A. Johansson, E. Widenkvist, J. Lu, M. Boman, U. Jansson, Nano Lett. 2005, 5, 1603.
8. H. Masuda, F. Hasegwa, S. Ono, J. Electrochem. Soc. 1997, 144. L127.
9. A. P. Li, F. Müller, A. Birner, K. Nielsch, U. Gösele, J. Appl. Phys. 1998, 84, 6023.
10. H. Masuda, H. Yamada, M. Satoh, H. Asoh, M. Nakao, T. Tamamura, Appl. Phys. Lett. 1997, 71, 2770.
11. C. Y. Liu, A. Datta, Y. L. Wang, Appl. Phys. Lett. 2001, 78, 120.
12. Z. Sun, H. K. Kim, Appl. Phys. Lett. 2002, 81, 3458.
13. W. Lee, R. Ji, C. A. Ross, U. Gösele, K. Nielsch, Small 2006, 2, 978.
14. H. Masuda, K. Yasui, K. Nishio, Adv. Mater. 2000, 12, 1031.
15. N. W. Liu, A. Datta, C. Y. Liu, C. Y. Peng, H. H. Wang, Y. L. Wang, Adv. Mater. 2005, 17, 222.
16. C. Y. Liu, A. Datta, N. W. Liu, C. Y. Peng, Y. L. Wang, Appl. Phys. Lett. 2004, 84, 2509.
17. J. Li, D. Stein, C. McMullan, D. Branton, M. J. Aziz, J. A. Golovchenko, Nature 2001, 412, 166.
18. T. Mitsui, D. Stein, Y. R. Kim, D. Hoogerheide, J. A. Golovchenko, Phys. Rev. Lett. 2006, 96, 036 102-1.
19. 3 [20], as also suggested by Li et al. [22].
20. M. Munoz, G. G. Qian, N. Karar, H. Cheng, I. G. Saveliev, N. Garcia, T. P. Moffat, P. J. Chen, L. Gan, W. F. Egelhoff, Appl. Phys. Lett. 2001, 79, 2946.
21. H. Oshima, H. Kikuchi, H. Nakao, T. Kamimura, T. Morikawa, K. Matsumoto, J. Yuan, S. Ishio, K. Nishio, H. Masuda, K. Itoh, IEEE Trans. Magn. 2007, 43, 2148.
22. F. Li, L. Zhang, R. M. Metzger, Chem. Mater. 1998, 10, 2470.