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Physica Status Solidi (A) Applications and Materials Science

Volumn 205, Issue 4, 2008, Pages 817-820

Enhancement in ellipsometric thin film sensitivity near surface plasmon resonance conditions

(3) Arwin, H a Poksinski, M a Johansen, K b

a LINKÖPING UNIVERSITY (Sweden)

b Scientific Engineering QED (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRIC PARAMETERS; FILM SENSITIVITIES; INTERNAL REFLECTIONS; ORDERS OF MAGNITUDES; REFLECTANCE RATIOS; SURFACE PLASMONS; THICKNESS SENSITIVITIES;

ELLIPSOMETRY; OPTICAL DATA STORAGE; PLASMONS; REFLECTION; RESONANCE; SURFACE PLASMON RESONANCE; THICK FILMS; THIN FILM DEVICES; THIN FILMS;

SENSITIVITY ANALYSIS;

EID: 54949133390 PISSN: 18626300 EISSN: 18626319 Source Type: Journal
DOI: 10.1002/pssa.200777899 Document Type: Article

Times cited : (28)

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