Crystalline bismuth oxide nanorods fabricated on Pt-coated substrates using a trimethylbismuth and oxygen mixture

Crystal Research and Technology

Volumn 43, Issue 7, 2008, Pages 695-699

  Kim, Hyoun Woo ^a   Lee, Jong Woo ^a   Shim, Seung Hyun ^a   Kebede, Mesfin A ^a   Lee, Chongmu ^a  

^a Inha University   (South Korea)

Author keywords

Bi2O3; Crystal growth; Nanorods

Indexed keywords

BISMUTH; CRYSTAL GROWTH; CRYSTALLINE MATERIALS; GRAIN BOUNDARIES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; METALLORGANIC VAPOR PHASE EPITAXY; MICROSCOPIC EXAMINATION; NANORODS; OXYGEN; PLATINUM; SILICON; SUBSTRATES; VAPORS;

BI2O3; BISMUTH OXIDES; COATED SUBSTRATES; EMISSION BANDS; METALORGANIC CHEMICAL VAPOR DEPOSITIONS; OXYGEN MIXTURES; OXYGEN SOURCES; PHOTOLUMINESCENCE MEASUREMENTS; ROOM TEMPERATURES; SI SUBSTRATES; TRANSMISSION ELECTRONS; X-RAY DIFFRACTIONS;

NANOSTRUCTURES;

EID: 54949126373     PISSN: 02321300     EISSN: 15214079     Source Type: Journal    
DOI: 10.1002/crat.200711155     Document Type: Article

References (27)

1. H. Gobrecht, S. Seeck, H. E. Bergt, A. Martens, and K. Kossmann, Phys. Stat. Sol. 33, 599 (1969).
2. V. Dolocan and F. lova, Phys. Stat. Sol. A 64, 755 (1981).
3. L. Leonite, M. Caraman, and G. I. Rusu, J. Optoelectron. Adv. Mater. 2, 385 (2000).
4. L. Leonite, M. Caraman, M. Alexe, and C. Hamagea, Surf. Sci. 507-510, 480 (2002).
5. M. Schuisky and A. Härsta, Chem. Vap. Dep. 2, 235 (1996).
6. T. Hyodo, E. Kanazawa, Y. Takao, Y. Shimizu, and M. Egashira, Electrochem. 68, 24 (2000).
7. G. Bandoli, D. Barecca, E. Brescacin, G. A. Rizzi, and E. Tondello, Chem. Vap. Dep. 2, 238 (1996).
8. A. Pan and A. Ghosh, J. Non-Cryst. Solids 271, 157 (2000).
9. H. Maeda, Y. Tamaka, M. Fukutoni, and T. Asano, Jpn. J. Appl. Phys. 27, L209 (1988).
10. C. A. Paz de Araujo, J. D. Cuchiaro, K. D. McMillan, M. C. Scott, and J. F. Scott, Nature 347, 627 (1995).
11. D. J. Taylor, R. E. Jones, P. Zurcher, P. Chu, Y. T. Lii, B. Jang, and S. J. Gillespie, Appl. Phys. Lett. 68, 2300 (1996).
12. K. Amanuma, T. Hase, and Y. Miyasaka, Appl. Phys. Lett. 66, 221 (1995).
13. B. Yang, M. Mo, H. Hu, C. Li, X. Yang, Q. Li, and Y. Qian, Eur. J. Inorg. Chem. 2004, 1785 (2004).
14. T. Takeyama, N. Takahashi, T. Nakamura, and S. Itoh, Solid State Commun. 133, 771 (2005).
15. K. Michalke, J. Meyer, A. V. Hirner, and R. Hensel, Appl. Organometal. Chem. 16, 221 (2002).
16. H. W. Kim and N. H. Kim, Appl. Phys. A 81, 763 (2005).
17. R. S. Wagner and W. C. Ellis, Appl. Phys. Lett. 4, 89 (1964).
18. Z. W. Pan, Z. R. Dai, and Z. L. Wang, Science 291, 1947 (2001).
19. G. W. Sears, Acta Metall. 3, 268 (1956).
20. H. W. Kim and S. H. Shim, Chem. Phys. Lett. 422, 165 (2006).
21. J. Guojian, Z. Hanrui, Z. Jiong, R. Meiling, L. Wenlan, W. Fengying, and Z. Baolin, J. Mater. Sci. 35, 63 (2000).
22. C. Bedoya, G. G. Condorelli, G. Anastasi, A. Baeri, F. Scerra, I. L. Fragala, J. G. Lisoni, and D. Wouters, Chem. Mater. 16, 3176 (2004).
23. Z. Wuzong, D. A. Jefferson, M. Alario-Franco, and J. M. Thomas, J. Phys. Chem. 91, 512 (1987).
24. V. V. Kharton, E. N. Naumovich, A. A. Yaremchenko, and F. M. B. Marques, J. Solid State Electrochem. 5, 160 (2001).
25. W. Dong and C. Zhu, J. Phys. Chem. Solids 64, 265 (2003).
26. H. W. Kim, J. W. Lee, and C. Lee, J. Korean Phys. Soc. 50, 1308 (2007).
27. H. W. Kim, J. W. Lee, and S. H. Shim, Sens. Actuators B 126, 306 (2007).