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Volumn 133, Issue 12, 2005, Pages 771-774

Bi2O3 rods deposited under atmospheric pressure by means of halide CVD on c-sapphire

Author keywords

A. Thin films; B. Crystal growth; D. Phase transitions

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; HALOGEN COMPOUNDS; MICROSTRUCTURE; NUCLEATION; OXYGEN; PARTIAL PRESSURE; PHASE TRANSITIONS; SAPPHIRE; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

EID: 14144249164     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2005.01.012     Document Type: Article
Times cited : (24)

References (14)
  • 13
    • 14144252734 scopus 로고    scopus 로고
    • JCPDS File No. 27-0052
    • International Centre of Diffraction Data, Release 2002 Powder Diffraction File, JCPDS File No. 27-0052, 2002.
    • (2002) Release 2002 Powder Diffraction File
  • 14
    • 14144251007 scopus 로고    scopus 로고
    • JCPDS File No. 41-1449
    • International Centre of Diffraction Data, Release 2002 Powder Diffraction File, JCPDS File No. 41-1449, 2002.
    • (2002) Release 2002 Powder Diffraction File


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.