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Volumn 133, Issue 12, 2005, Pages 771-774
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Bi2O3 rods deposited under atmospheric pressure by means of halide CVD on c-sapphire
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Author keywords
A. Thin films; B. Crystal growth; D. Phase transitions
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Indexed keywords
ATMOSPHERIC PRESSURE;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL GROWTH;
HALOGEN COMPOUNDS;
MICROSTRUCTURE;
NUCLEATION;
OXYGEN;
PARTIAL PRESSURE;
PHASE TRANSITIONS;
SAPPHIRE;
SCANNING ELECTRON MICROSCOPY;
SUBSTRATES;
SURFACES;
THIN FILMS;
X RAY DIFFRACTION ANALYSIS;
BISMUTH OXIDE;
C-SAPPHIRE;
HALIDE CVD;
OXYGEN-ION CONDUCTIVITY;
BISMUTH COMPOUNDS;
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EID: 14144249164
PISSN: 00381098
EISSN: None
Source Type: Journal
DOI: 10.1016/j.ssc.2005.01.012 Document Type: Article |
Times cited : (24)
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References (14)
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