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Applied Physics A: Materials Science and Processing

Volumn 93, Issue 3, 2008, Pages 705-710

Growth of thin films of TiN on MgO(100) monitored by high-pressure RHEED

(6) Pryds, N a Cockburn, D a Rodrigo, K a Rasmussen, I L a Knudsen, J a Schou, J a

a TECHNICAL UNIVERSITY OF DENMARK (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

FIELD EMISSION; HIGH ENERGY ELECTRON DIFFRACTION; MICROSCOPIC EXAMINATION; NITRIDES; PROGRAMMABLE LOGIC CONTROLLERS; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; THICK FILMS; THIN FILMS; THREE DIMENSIONAL; TIN; TITANIUM; TITANIUM COMPOUNDS;

ATOMIC FORCES; CONTINUOUS; CONTINUOUS SURFACES; FIELD EMISSION SCANNING ELECTRON MICROSCOPIES; FORMATION OF ISLANDS; GROWTH OF THIN FILMS; HIGH PRESSURES; INITIAL STAGES; MGO SUBSTRATES; MGO(100); PULSED LASERS; REFLECTION HIGH-ENERGY ELECTRON DIFFRACTIONS; SMOOTH SURFACES; TIN FILMS;

TITANIUM NITRIDE;

EID: 54949106143 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-008-4700-2 Document Type: Article

Times cited : (14)

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