A new removable resist for high aspect ratio applications

Microsystem Technologies

Volumn 13, Issue 3-4, 2007, Pages 335-338

  Schirmer, Matthias ^a   Perseke, Doris ^a   Zena, Eva ^a   Schondelmaier, Daniel ^b   Rudolph, Ivo ^b   Loechel, Bernd ^b  

^a Allresist GmbH   (Germany)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; MASKS; MICROELECTROMECHANICAL DEVICES; X RAYS;

NEGATIVE TONE PHOTORESIST CAR; X-RAY MASK FABRICATION;

PHOTORESISTS;

EID: 33845745878     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-006-0189-9     Document Type: Article

References (0)