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Volumn 39, Issue 11, 2008, Pages 1379-1381
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Chemical and morphological properties of (Ti-Zr)N thin films grown in an arc pulsed system
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Author keywords
(Ti Zr)N; Arc pulsed; SPM; XPS
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Indexed keywords
ARGON;
CAVITY RESONATORS;
CHEMICAL PROPERTIES;
FRICTION;
INERT GASES;
MICROSCOPIC EXAMINATION;
MOLECULAR ORBITALS;
NITRIDES;
PHOTOELECTRON SPECTROSCOPY;
PLASMA DEPOSITION;
SELF PHASE MODULATION;
SOLIDS;
STATISTICAL PROCESS CONTROL;
THICK FILMS;
THIN FILMS;
TITANIUM;
TITANIUM NITRIDE;
TRIBOLOGY;
ZIRCONIUM;
(TI-ZR)N;
ARC PULSED;
CHEMICAL COMPOSITIONS;
ELECTRONICS;
FRICTION COEFFICIENTS;
GRAIN SIZES;
MORPHOLOGICAL PROPERTIES;
NITROGEN MIXTURES;
PULSED ARCS;
PULSED SYSTEMS;
SCANNING PROBES;
SPM;
SYSTEM USING;
X-RAY PHOTOELECTRON SPECTROSCOPIES;
XPS;
X RAY PHOTOELECTRON SPECTROSCOPY;
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EID: 54849440158
PISSN: 00262692
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mejo.2008.01.067 Document Type: Article |
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Times cited : (5)
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References (5)
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