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Volumn 517, Issue 1, 2008, Pages 209-212

Initial oxidation of HF-acid treated SiGe(100) surfaces under air exposure investigated by synchrotron radiation X-ray photoelectron spectroscopy and IR absorption spectroscopy

Author keywords

HF acid; IRAS; Oxidation; SiGe(100); Synchrotron radiation; XPS

Indexed keywords

ABSORPTION; ACIDS; CHEMICAL OXYGEN DEMAND; ELECTROMAGNETIC WAVES; ELECTRON SPECTROSCOPY; HYDROGEN; INFRARED ABSORPTION; INFRARED SPECTROSCOPY; INTERNAL OXIDATION; OXIDATION; PASSIVATION; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTOIONIZATION; PHOTONS; SEMICONDUCTING GERMANIUM COMPOUNDS; SILICON; SILICON ALLOYS; SILICON COMPOUNDS; SPECTRUM ANALYSIS; SURFACE TREATMENT; SYNCHROTRON RADIATION; SYNCHROTRONS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 54849420272     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.08.043     Document Type: Article
Times cited : (7)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.