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Volumn 517, Issue 1, 2008, Pages 209-212
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Initial oxidation of HF-acid treated SiGe(100) surfaces under air exposure investigated by synchrotron radiation X-ray photoelectron spectroscopy and IR absorption spectroscopy
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Author keywords
HF acid; IRAS; Oxidation; SiGe(100); Synchrotron radiation; XPS
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Indexed keywords
ABSORPTION;
ACIDS;
CHEMICAL OXYGEN DEMAND;
ELECTROMAGNETIC WAVES;
ELECTRON SPECTROSCOPY;
HYDROGEN;
INFRARED ABSORPTION;
INFRARED SPECTROSCOPY;
INTERNAL OXIDATION;
OXIDATION;
PASSIVATION;
PHOTOELECTRICITY;
PHOTOELECTRON SPECTROSCOPY;
PHOTOIONIZATION;
PHOTONS;
SEMICONDUCTING GERMANIUM COMPOUNDS;
SILICON;
SILICON ALLOYS;
SILICON COMPOUNDS;
SPECTRUM ANALYSIS;
SURFACE TREATMENT;
SYNCHROTRON RADIATION;
SYNCHROTRONS;
X RAY PHOTOELECTRON SPECTROSCOPY;
ACID TREATMENTS;
AIR EXPOSURES;
BACKBONDS;
HF ACID;
HIGHLY SENSITIVES;
HYDROGEN PASSIVATIONS;
INFRARED ABSORPTION SPECTROSCOPIES;
INITIAL OXIDATIONS;
IR ABSORPTION SPECTROSCOPIES;
IRAS;
REFLECTION GEOMETRIES;
SELECTIVE OXIDATIONS;
SIGE(100);
X-RAY PHOTOELECTRON SPECTROSCOPIES;
XPS;
ABSORPTION SPECTROSCOPY;
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EID: 54849420272
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2008.08.043 Document Type: Article |
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Times cited : (7)
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References (13)
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